Invention Grant
- Patent Title: Nitride semiconductor structure
- Patent Title (中): 氮化物半导体结构
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Application No.: US14810433Application Date: 2015-07-27
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Publication No.: US09406845B2Publication Date: 2016-08-02
- Inventor: Yen-Lin Lai , Jyun-De Wu
- Applicant: PlayNitride Inc.
- Applicant Address: TW Tainan
- Assignee: PlayNitride Inc.
- Current Assignee: PlayNitride Inc.
- Current Assignee Address: TW Tainan
- Agency: Jianq Chyun IP Office
- Priority: TW103132462A 20140919
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L33/32 ; H01L33/06 ; H01L29/15

Abstract:
A nitride semiconductor structure including a substrate, a first type nitride semiconductor layer disposed on the substrate, an active layer disposed between the substrate and the first type nitride semiconductor layer and a second type nitride semiconductor layer disposed between the substrate and the active layer is provided. The active layer includes a first multiple quantum well structure including a plurality of first quantum well layers and a plurality of first barrier layers staggered with each other, and a second multiple quantum well structure including a plurality of second quantum well layers and a plurality of second barrier layers staggered with each other. A second type dopant is doped into at least one of the second barrier layers, and a concentration of the second dopant in the second barrier layer is higher than that of the second dopant in the second type nitride semiconductor layer.
Public/Granted literature
- US20160087154A1 NITRIDE SEMICONDUCTOR STRUCTURE Public/Granted day:2016-03-24
Information query
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