Invention Grant
- Patent Title: Method for cleansing glass substrate and device for performing the method
- Patent Title (中): 玻璃基板的清洗方法及其制造方法
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Application No.: US14111560Application Date: 2013-07-26
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Publication No.: US09409215B2Publication Date: 2016-08-09
- Inventor: Shihying Sun
- Applicant: Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Applicant Address: CN Shenzhen, Guangdong
- Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd
- Current Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd
- Current Assignee Address: CN Shenzhen, Guangdong
- Agent Andrew C. Cheng
- Priority: CN201310314174 20130724
- International Application: PCT/CN2013/080233 WO 20130726
- International Announcement: WO2015/010340 WO 20150129
- Main IPC: B08B11/04
- IPC: B08B11/04 ; B08B7/04 ; A47L5/14 ; B08B5/02 ; B08B7/02 ; B08B15/04 ; C03C23/00

Abstract:
The present invention provides a method for cleansing a glass substrate and a device for performing the method. The method includes: (1) providing a transport platform (20) and a glass substrate to be cleansed (40); (2) placing a glass substrate to be cleansed (40) on the transport platform (20); (3) providing two air blowing devices (60); (4) the two air blowing devices (60) blowing air flows toward the lass substrate to be cleansed (40) to have impurities (42) that are attached to the glass substrate to be cleansed (40) detached from the glass substrate (40); (5) providing a suction device (80), the suction device (80) comprising an air drawing device (82) and a magnetic attraction device (84); (6) the air drawing device (82) drawing air from the glass substrate to be cleansed (40) and the magnetic attraction device (84) generating a magnetic attraction force to magnetic impurities on the glass substrate to be cleansed (40) so as to draw the impurities (42) attached to the glass substrate to be cleansed (40) into the suction device (80).
Public/Granted literature
- US20150027490A1 METHOD FOR CLEANSING GLASS SUBSTRATE AND DEVICE FOR PERFORMING THE METHOD Public/Granted day:2015-01-29
Information query
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