Invention Grant
- Patent Title: Heat treatment method for synthetic quartz glass
- Patent Title (中): 合成石英玻璃的热处理方法
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Application No.: US13945631Application Date: 2013-07-18
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Publication No.: US09409812B2Publication Date: 2016-08-09
- Inventor: Shigeo Harada
- Applicant: Shigeo Harada
- Applicant Address: DE Hanau JP Tokyo
- Assignee: Heraeus Quarzglas GmbH & Co. KG,Shin-Etsu Quartz Products Co., Ltd.
- Current Assignee: Heraeus Quarzglas GmbH & Co. KG,Shin-Etsu Quartz Products Co., Ltd.
- Current Assignee Address: DE Hanau JP Tokyo
- Agency: Tiajoloff & Kelly LLP
- Priority: JP2012-186392 20120827
- Main IPC: C03B32/00
- IPC: C03B32/00 ; C03B25/00 ; C03B19/06 ; C03B19/14

Abstract:
[Problem]The provision of a synthetic quartz glass heat treatment method that can, by a single heat treatment, and without particular limitations on the OH group concentration distribution of the starting material, regulate the birefringence fast axis direction in the synthetic quartz glass after it has been heat-treated.[Means of overcoming the problem]A heat treatment method for synthetic quartz glass whereby columnar synthetic quartz glass having two opposing end faces and a lateral face is heat-treated covered with thermal insulator; wherein said heat treatment is performed using as end face thermal insulator which covers said two end faces, and as lateral face thermal insulator which covers said lateral face, thermal insulators that differ in at least either type or thickness to afford different thermal insulation effects such that the birefringence fast axis direction of said synthetic quartz glass is regulated.
Public/Granted literature
- US20140053608A1 HEAT TREATMENT METHOD FOR SYNTHETIC QUARTZ GLASS Public/Granted day:2014-02-27
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