Invention Grant
- Patent Title: Thin film deposition apparatus
- Patent Title (中): 薄膜沉积装置
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Application No.: US14018701Application Date: 2013-09-05
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Publication No.: US09410237B2Publication Date: 2016-08-09
- Inventor: HeungYeol Na , Jae hong Ahn , Wonsik Hyun
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin, Gyeonggi-do
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Yongin, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2013-0037596 20130405
- Main IPC: C23C14/24
- IPC: C23C14/24

Abstract:
A thin film deposition apparatus includes a vacuum chamber, a substrate supporter disposed in the vacuum chamber to support a target substrate on which a thin film is deposited, and a deposition source that evaporates a deposition material and supplies the evaporated deposition material to the target substrate. The deposition source includes a crucible that includes a deposition material-containing portion to accommodate the deposition material and a first flange at an upper end of the deposition material-containing portion, a spray nozzle that includes a spray portion through which the evaporated deposition material is sprayed and a second flange at a lower end of the spray portion to make contact with the first flange, and a cooling member attached to an outer surface of the first flange and the second flange.
Public/Granted literature
- US20140299060A1 THIN FILM DEPOSITION APPARATUS Public/Granted day:2014-10-09
Information query
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