Invention Grant
- Patent Title: Method for producing a silicon single crystal
- Patent Title (中): 硅单晶的制造方法
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Application No.: US13969818Application Date: 2013-08-19
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Publication No.: US09410262B2Publication Date: 2016-08-09
- Inventor: Josef Lobmeyer , Georg Brenninger , Waldemar Stein
- Applicant: Siltronic AG
- Applicant Address: DE Munich
- Assignee: SILTRONIC AG
- Current Assignee: SILTRONIC AG
- Current Assignee Address: DE Munich
- Agency: Brooks Kushman P.C.
- Priority: DE102012215677 20120904
- Main IPC: C30B13/08
- IPC: C30B13/08 ; C30B13/20 ; C30B29/06 ; C30B13/10

Abstract:
A silicon single crystal is produced by a method wherein a silicon plate is inductively heated; granular silicon is melted on the silicon plate; and the molten silicon thus produced flows through a flow conduit in the center of the plate to a phase boundary at which a silicon single crystal crystallizes, wherein a silicon ring having a lower resistivity than the plate, and lying on the plate, is inductively heated prior to inductively heating the plate, and melting the ring.
Public/Granted literature
- US20140060421A1 METHOD FOR PRODUCING A SILICON SINGLE CRYSTAL Public/Granted day:2014-03-06
Information query
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