Invention Grant
- Patent Title: Illumination apparatus and pattern inspection apparatus
- Patent Title (中): 照明装置和图案检查装置
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Application No.: US14607737Application Date: 2015-01-28
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Publication No.: US09410899B2Publication Date: 2016-08-09
- Inventor: Toshiaki Otaki , Riki Ogawa
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2014-018263 20140203
- Main IPC: G01N21/88
- IPC: G01N21/88 ; G01N21/956 ; G02B26/08 ; G02B5/18 ; G02B27/48 ; G02B26/06

Abstract:
An illumination apparatus according to embodiments includes: a light source generating laser light; a rotational phase plate having a plurality of randomly arranged stepped regions, the rotational phase plate transmitting the laser light to give a phase change to the laser light; and an integrator including a plurality of lenses arranged in an array, the laser light transmitted through the rotational phase plate being incident on the integrator, an allowable angle of incidence for the laser light of the lenses being set at a maximum value of or larger than an angle of diffraction of a first order of the laser light at the rotational phase plate.
Public/Granted literature
- US20150219568A1 ILLUMINATION APPARATUS AND PATTERN INSPECTION APPARATUS Public/Granted day:2015-08-06
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