Invention Grant
- Patent Title: Chemically amplified resist composition and patterning process
- Patent Title (中): 化学扩增抗蚀剂组合物和图案化工艺
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Application No.: US14820839Application Date: 2015-08-07
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Publication No.: US09411226B2Publication Date: 2016-08-09
- Inventor: Jun Hatakeyama
- Applicant: SHIN-ETSU CHEMICAL CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2014-166583 20140819
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/30 ; G03F7/039 ; G03F7/038 ; G03F7/20 ; G03F7/32
Abstract:
A chemically amplified resist composition comprising a base polymer, an acid generator, and a specific oxime compound has a high contrast of alkaline dissolution rate before and after exposure and high resolution and forms a pattern of satisfactory profile with minimal roughness and wide focus margin.
Public/Granted literature
- US20160054652A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS Public/Granted day:2016-02-25
Information query
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