Invention Grant
- Patent Title: Polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatus
- Patent Title (中): 具有极化影响的光学布置，特别是在微光刻投影曝光装置中
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Application No.: US14297273Application Date: 2013-01-11
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Publication No.: US09411245B2Publication Date: 2016-08-09
- Inventor: Ingo Saenger , Frank Schlesener
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102012200368 20120112
- International Application: PCT/EP2013/050462 WO 20130111
- International Announcement: WO2013/104744 WO 20130718
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G03B27/54 ; G03F7/20 ; G02B27/28 ; G02B5/30
Abstract:
The disclosure provides a polarization-influencing optical arrangement that includes a first retardation element and a second retardation element. The optical arrangement is configurable so that a polarization-influencing effect of the first retardation element corresponds to an effect of a first lambda/2 plate having a first fast axis of the birefringence and a polarization-influencing effect of the second retardation element corresponds to an effect of a second lambda/2 plate having a second fast axis of the birefringence. An angle between the first fast axis and the second fast axis is 45°±5°.
Public/Granted literature
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