Invention Grant
US09412586B2 Method for producing a template for epitaxial growth having a sapphire (0001) substrate, an initial-stage A1N layer and laterally overgrown A1XGAYN (0001) layer
有权
制备用于外延生长的模板的方法,其具有蓝宝石(0001)衬底,初始阶段A1N层和横向长满的AlXGAYN(0001)层
- Patent Title: Method for producing a template for epitaxial growth having a sapphire (0001) substrate, an initial-stage A1N layer and laterally overgrown A1XGAYN (0001) layer
- Patent Title (中): 制备用于外延生长的模板的方法,其具有蓝宝石(0001)衬底,初始阶段A1N层和横向长满的AlXGAYN(0001)层
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Application No.: US13517970Application Date: 2009-12-25
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Publication No.: US09412586B2Publication Date: 2016-08-09
- Inventor: Hiroshi Amano , Satoshi Kamiyama , Myunghee Kim , Cyril Pernot , Akira Hirano
- Applicant: Hiroshi Amano , Satoshi Kamiyama , Myunghee Kim , Cyril Pernot , Akira Hirano
- Applicant Address: JP Aichi
- Assignee: SOKO KAGAKU CO., LTD.
- Current Assignee: SOKO KAGAKU CO., LTD.
- Current Assignee Address: JP Aichi
- Agency: Haynes Beffel & Wolfeld LLP
- International Application: PCT/JP2009/071541 WO 20091225
- International Announcement: WO2011/077541 WO 20110630
- Main IPC: C30B25/18
- IPC: C30B25/18 ; H01L21/02 ; C30B29/40 ; H01L33/00

Abstract:
A surface of a sapphire (0001) substrate is processed to form recesses and protrusions so that protrusion tops are flat and a given plane-view pattern is provided. An initial-stage AlN layer is grown on the surface of the sapphire (0001) substrate having recesses and protrusions by performing a C+ orientation control so that a C+ oriented AlN layer is grown on flat surfaces of the protrusion tops, excluding edges, in such a thickness that the recesses are not completely filled and the openings of the recesses are not closed. An AlxGayN(0001) layer (1≧x>0, x+y=1) is epitaxially grown on the initial-stage AlN layer by a lateral overgrowth method. The recesses are covered with the AlxGayN(0001) layer laterally overgrown from above the protrusion tops. Thus, an template for epitaxial growth having a fine and flat surface and a reduced threading dislocation density is produced.
Public/Granted literature
- US20120258286A1 Template for Epitaxial Growth and Process for Producing Same Public/Granted day:2012-10-11
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