Invention Grant
- Patent Title: Through-silicon via access device for integrated circuits
- Patent Title (中): 通过硅片通过集成电路接入装置
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Application No.: US14476865Application Date: 2014-09-04
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Publication No.: US09412682B2Publication Date: 2016-08-09
- Inventor: Harry Barowski , Joachim Keinert , Sridhar H. Rangarajan , Haoxing Ren , Sourav Saha
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Main IPC: H03K19/173
- IPC: H03K19/173 ; H01L23/48 ; H01L25/065 ; H01L23/00

Abstract:
A through-silicon via access device (TSVAD) for establishing an electrical connection to a through-silicon via (TSV) located in a planar stack of semiconductor chips is disclosed. The TSVAD may include a switching circuit, having a conductive pad terminal, a TSV terminal, an input terminal coupled to a sending logic circuit, an output terminal coupled to a receiving logic circuit, and logic devices to, in response to control signals, couple the TSV terminal to the conductive pad terminal, in one configuration, and couple the TSV terminal to another terminal in another configuration. The TSVAD may also include a control circuit to generate control signals to cause an input selection circuit to drive a signal from the sending logic circuit onto the input terminal, and to cause an output selection circuit to drive a logic signal from the output terminal to the receiving logic circuit.
Public/Granted literature
- US20160071783A1 THROUGH-SILICON VIA ACCESS DEVICE FOR INTEGRATED CIRCUITS Public/Granted day:2016-03-10
Information query
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