Invention Grant
US09412694B2 Polysilicon fuse, manufacturing method thereof, and semiconductor device including polysilicon fuse
有权
多晶硅熔丝及其制造方法以及包括多晶硅熔丝的半导体器件
- Patent Title: Polysilicon fuse, manufacturing method thereof, and semiconductor device including polysilicon fuse
- Patent Title (中): 多晶硅熔丝及其制造方法以及包括多晶硅熔丝的半导体器件
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Application No.: US14278077Application Date: 2014-05-15
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Publication No.: US09412694B2Publication Date: 2016-08-09
- Inventor: Hideaki Katakura
- Applicant: FUJI ELECTRIC CO., LTD.
- Applicant Address: JP Kawasaki-shi
- Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee Address: JP Kawasaki-shi
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2013-105224 20130517
- Main IPC: H01L23/52
- IPC: H01L23/52 ; H01L23/525 ; H01L21/768

Abstract:
A polysilicon fuse is disclosed that is capable of securing good insulation after being cut into small areas. A manufacturing method for the fuse and a small-size and highly-reliable semiconductor device including a polysilicon fuse also are disclosed. By forming a cavity inside a polysilicon portion serving as a melting portion by setting the melting portion of the polysilicon fuse to be a vertical type, a gap is formed between an upper part electrode and the surface of melted polysilicon when the polysilicon fuse is cut off. Because of this gap, good insulation can be secured. By using this polysilicon fuse, a semiconductor device that has a small size and high reliability is provided.
Public/Granted literature
- US20140339675A1 POLYSILICON FUSE, MANUFACTURING METHOD THEREOF, AND SEMICONDUCTOR DEVICE INCLUDING POLYSILICON FUSE Public/Granted day:2014-11-20
Information query
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