Invention Grant
- Patent Title: Baseplate supporting pin and baseplate supporting device using the same
- Patent Title (中): 底板支撑销和底板支撑装置使用相同
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Application No.: US13984387Application Date: 2013-03-19
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Publication No.: US09414439B2Publication Date: 2016-08-09
- Inventor: Shoukun Wang , Liang Sun
- Applicant: BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
- Applicant Address: CN Beijing CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.,BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.,BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Beijing CN Beijing
- Agency: LADAS & PARRY LLP
- Priority: CN201220160486U 20120416
- International Application: PCT/CN2013/072891 WO 20130319
- International Announcement: WO2013/155913 WO 20131024
- Main IPC: H05B3/06
- IPC: H05B3/06 ; H05B1/02 ; H01L21/67 ; H01L21/687

Abstract:
According to embodiments of present invention, a baseplate supporting pin is provided, which comprises: a pin body; a heating device embedded into the pin body; and a first control unit electrically connected to the heating device for controlling the heating device. Furthermore, according to embodiments of present invention, a baseplate supporting device is provided, which comprises: a baseplate support member; and a baseplate supporting pin, provided to ascend or descend through an opening formed in the baseplate supporting plate so as to support the baseplate thereon or place the baseplate on the baseplate support member, wherein the baseplate supporting pin comprises: a pin body; a heating device built in the pin body; and a first control unit electrically connected to the heating device for controlling the heating device. The baseplate supporting pin and the baseplate supporting device facilitate eliminating adverse effect caused by uneven heating of the baseplate.
Public/Granted literature
- US20140054282A1 BASEPLATE SUPPORTING PIN AND BASEPLATE SUPPORTING DEVICE USING THE SAME Public/Granted day:2014-02-27
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