Invention Grant
US09431265B2 Fin cut for tight fin pitch by two different sit hard mask materials on fin
有权
翅片上通过两种不同的坐式硬掩模材料对翅片进行切割
- Patent Title: Fin cut for tight fin pitch by two different sit hard mask materials on fin
- Patent Title (中): 翅片上通过两种不同的坐式硬掩模材料对翅片进行切割
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Application No.: US14499595Application Date: 2014-09-29
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Publication No.: US09431265B2Publication Date: 2016-08-30
- Inventor: Kangguo Cheng , Ali Khakifirooz , Alexander Reznicek , Tenko Yamashita
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent Daniel P. Morris, Esq.
- Main IPC: H01L21/308
- IPC: H01L21/308 ; H01L29/06
Abstract:
Methods that enable fin cut at very tight pitch are provided. After forming a first set of paired sidewall image transfer (SIT) spacers and a second set of paired SIT spacers composed of different materials, portions of the first set of the paired SIT spacers can be selectively removed without adversely affecting the second set of the paired SIT spacers, even portions of both sets of the paired SIT spacers are exposed by the cut mask due to the different etching characteristics of the different materials.
Public/Granted literature
- US20160093502A1 FIN CUT FOR TIGHT FIN PITCH BY TWO DIFFERENT SIT HARD MASK MATERIALS ON FIN Public/Granted day:2016-03-31
Information query
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