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US09431348B2 Semiconductor device manufacturing method and manufacturing device for marking a crystal defect 有权
用于标记晶体缺陷的半导体器件制造方法和制造装置

Semiconductor device manufacturing method and manufacturing device for marking a crystal defect
Abstract:
A marker which is a reference of a coordinate position defining a region of a chip that is manufactured in a semiconductor substrate is formed. A crystal defect on the semiconductor substrate is detected. The coordinate position of the detected crystal defect is detected on the basis of the marker. Therefore, it is possible to detect the position of a semiconductor chip including the crystal defect among the semiconductor chips manufactured on the semiconductor substrate. As a result, it is possible to easily detect the position of the semiconductor device including the position of the crystal defect on the semiconductor substrate.
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