Invention Grant
- Patent Title: Method for manufacturing liquid jetting apparatus and liquid jetting apparatus
- Patent Title (中): 液体喷射装置和液体喷射装置的制造方法
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Application No.: US14806829Application Date: 2015-07-23
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Publication No.: US09434163B2Publication Date: 2016-09-06
- Inventor: Keita Hirai
- Applicant: Brother Kogyo Kabushiki Kaisha
- Applicant Address: JP Aichi-ken
- Assignee: Brother Kogyo Kabushiki Kaisha
- Current Assignee: Brother Kogyo Kabushiki Kaisha
- Current Assignee Address: JP Aichi-ken
- Agency: Frommer Lawrence & Haug LLP
- Priority: JP2014-155809 20140731
- Main IPC: B41J2/045
- IPC: B41J2/045 ; B21D53/76 ; B23P17/00 ; B41J2/14 ; B41J2/16

Abstract:
A method for manufacturing a liquid jetting apparatus, which is provided with: a flow passage formation member including a pressure chamber, and a piezoelectric actuator having a vibration film provided on the flow passage formation member, a piezoelectric film arranged on the vibration film to correspond to the pressure chamber, first and second electrodes arranged on different surfaces of the piezoelectric film, a first protective film covering the piezoelectric film, a wire connected to the second electrode, and a second protective film covering the wire, includes: forming a first protective film on the vibration film to cover the piezoelectric film and the second electrode; forming the wire and the second protective film to cover the wire with the first protective film covering the piezoelectric film and the second electrode; and removing a part, of the first protective film, that overlaps with the second electrode, after forming the second protective film.
Public/Granted literature
- US20160031215A1 METHOD FOR MANUFACTURING LIQUID JETTING APPARATUS AND LIQUID JETTING APPARATUS Public/Granted day:2016-02-04
Information query
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