Invention Grant
- Patent Title: Wafer encapsulated microelectromechanical structure
- Patent Title (中): 晶圆封装微机电结构
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Application No.: US14524986Application Date: 2014-10-27
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Publication No.: US09434608B2Publication Date: 2016-09-06
- Inventor: Aaron Partridge , Markus Lutz , Pavan Gupta
- Applicant: SiTime Corporation
- Applicant Address: US CA Sunnyvale
- Assignee: SiTime Corporation
- Current Assignee: SiTime Corporation
- Current Assignee Address: US CA Sunnyvale
- Agent Charles Shemwell
- Main IPC: H01L23/051
- IPC: H01L23/051 ; B81C1/00 ; H01L41/113 ; B81B7/00

Abstract:
A cavity is formed within a first substrate together with trenches that separate first and second portions of the first substrate from each other and from the remainder of the first substrate. The first portion of the first substrate is disposed within the cavity and constitutes a microelectromechanical structure, while the second portion of the substrate is disposed at least partly within the cavity and constitutes a first portion of an electrical contact. A second substrate is secured to the first substrate over the cavity to define a chamber containing the microelectromechanical structure. The second substrate has a first portion that constitutes a second portion of the electrical contact and is disposed in electrical contact with the second portion of the first substrate such that the electrical contact extends from within the chamber to an exterior of the chamber.
Public/Granted literature
- US20150041928A1 WAFER ENCAPSULATED MICROELECTROMECHANICAL STRUCTURE Public/Granted day:2015-02-12
Information query
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