Invention Grant
- Patent Title: Testing of thru-silicon vias
- Patent Title (中): 硅通孔测试
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Application No.: US14283116Application Date: 2014-05-20
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Publication No.: US09435846B2Publication Date: 2016-09-06
- Inventor: Javier DeLaCruz
- Applicant: eSilicon Corporation
- Applicant Address: US CA San Jose
- Assignee: eSilicon Corporation
- Current Assignee: eSilicon Corporation
- Current Assignee Address: US CA San Jose
- Agency: Fenwick & West LLP
- Main IPC: G01R31/02
- IPC: G01R31/02 ; G01R31/26 ; G01R31/3185 ; G01R31/28

Abstract:
A system and a method for testing thru silicon vias (TSVs) in a silicon die. A silicon die containing multiple TSVs is mounted on a wafer tape. Two probe points are probed on the exposed side of the silicon die. A resistance is measured between the two probe points and an electrical integrity is determined based on the measured resistance.
Public/Granted literature
- US20140347089A1 Testing of Thru-Silicon Vias Public/Granted day:2014-11-27
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