Invention Grant
- Patent Title: Optical arrangement and microlithographic projection exposure apparatus including same
- Patent Title (中): 包括其的光学布置和微光刻投影曝光设备
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Application No.: US13407466Application Date: 2012-02-28
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Publication No.: US09436101B2Publication Date: 2016-09-06
- Inventor: Armin Schoeppach , Hans-Juergen Mann , Frank Eisert , Yim-Bun Patrick Kwan
- Applicant: Armin Schoeppach , Hans-Juergen Mann , Frank Eisert , Yim-Bun Patrick Kwan
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102009045163 20090930
- Main IPC: G03B27/68
- IPC: G03B27/68 ; G03B27/70 ; G03F7/20 ; G02B17/06
Abstract:
An optical arrangement includes at least one optical element and a support element for the optical element. The optical element and the support element are connected together by way of at least three decoupling elements. The decoupling elements are formed monolithically with the optical element and with the support element.
Public/Granted literature
- US20120182533A1 OPTICAL ARRANGEMENT AND MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS INCLUDING SAME Public/Granted day:2012-07-19
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