Invention Grant
- Patent Title: Insulated dielectric window assembly of an inductively coupled plasma processing apparatus
- Patent Title (中): 电感耦合等离子体处理装置的绝缘介电窗组件
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Application No.: US13462305Application Date: 2012-05-02
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Publication No.: US09437400B2Publication Date: 2016-09-06
- Inventor: David Setton , Gautam Bhattacharyya , Brett C. Richardson
- Applicant: David Setton , Gautam Bhattacharyya , Brett C. Richardson
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Buchanan Ingersoll & Rooney PC
- Main IPC: C23C16/00
- IPC: C23C16/00 ; H01L21/326 ; H01J37/32
Abstract:
An insulated dielectric window assembly comprising a dielectric window of an inductively coupled plasma processing apparatus; an upper polymeric ring, and a lower polymeric ring. The upper polymeric ring insulates the outer edge of the dielectric window from a cooler ambient atmosphere and the lower polymeric ring insulates the lower surface of the dielectric window from a chamber surface supporting the window.
Public/Granted literature
- US20130292055A1 INSULATED DIELECTRIC WINDOW ASSEMBLY OF AN INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS Public/Granted day:2013-11-07
Information query
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