Methods for etching substrate and semiconductor devices

Invention Grant

US09437441B2 Methods for etching substrate and semiconductor devices 有权

Title translation: 蚀刻基板和半导体器件的方法

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Patent Title: Methods for etching substrate and semiconductor devices
Patent Title (中): 蚀刻基板和半导体器件的方法
Application No.: US14835513

Application Date: 2015-08-25
Publication No.: US09437441B2

Publication Date: 2016-09-06
Inventor: Jungwoo Oh , Yunwon Song , Bugeun Ki , Keorock Choi
Applicant: Industry-Academic Cooperation Foundation, Yonsei University
Applicant Address: KR Seoul
Assignee: INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY
Current Assignee: INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY
Current Assignee Address: KR Seoul
Agency: Procopio, Cory, Hargreaves & Savitch LLP
Priority: KR10-2014-0155921 20141111
Main IPC: H01L21/311
IPC: H01L21/311 ; H01L21/461 ; H01L29/06 ; H01L21/306

Methods for etching substrate and semiconductor devices

Abstract:

A method of etching a substrate using a metal-assisted chemical etching process is provided. The method may include forming a metal catalytic layer to a predetermined thickness on a substrate and reacting the metal catalytic layer with the etching solution to form a porous surface in the metal catalytic layer and etch the substrate. When the metal catalytic layer is reacted with an etching solution, a porous surface may be formed on the metal catalytic layer.

Abstract(Chinese):

提供了使用金属辅助化学蚀刻工艺蚀刻衬底的方法。该方法可以包括在基底上形成预定厚度的金属催化剂层并使金属催化层与蚀刻溶液反应，以在金属催化剂层中形成多孔表面并蚀刻该基材。当金属催化剂层与蚀刻溶液反应时，可以在金属催化剂层上形成多孔表面。

Public/Granted literature

US20160133478A1 METHODS FOR ETCHING SUBSTRATE AND SEMICONDUCTOR DEVICES Public/Granted day:2016-05-12

Information query

Espacenet

IPC分类:

H	电学
H01	基本电气元件
H01L	半导体器件；其他类目中不包括的电固体器件（使用半导体器件的测量入G01；一般电阻器入H01C；磁体、电感器、变压器入H01F；一般电容器入H01G；电解型器件入H01G9/00；电池组、蓄电池入H01M；波导管、谐振器或波导型线路入H01P；线路连接器、汇流器入H01R；受激发射器件入H01S；机电谐振器入H03H；扬声器、送话器、留声机拾音器或类似的声机电传感器入H04R；一般电光源入H05B；印刷电路、混合电路、电设备的外壳或结构零部件、电气元件的组件的制造入H05K；在具有特殊应用的电路中使用的半导体器件见应用相关的小类）
H01L21/00	专门适用于制造或处理半导体或固体器件或其部件的方法或设备
H01L21/02	.半导体器件或其部件的制造或处理
H01L21/04	..至少具有一个跃变势垒或表面势垒的器件，例如PN结、耗尽层、载体集结层
H01L21/18	...器件有由周期表Ⅳ族元素或含有/不含有杂质的AⅢBⅤ族化合物构成的半导体，如掺杂材料
H01L21/30	....用H01L21/20至H01L21/26各组不包含的方法或设备处理半导体材料的（在半导体材料上制作电极的入H01L21/28）
H01L21/31	.....在半导体材料上形成绝缘层的，例如用于掩膜的或应用光刻技术的（密封层入H01L21/56）；以及这些层的后处理；这些层的材料的选择
H01L21/3105	......后处理
H01L21/311	.......绝缘层的刻蚀