Invention Grant
- Patent Title: Semiconductor device
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Application No.: US14882111Application Date: 2015-10-13
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Publication No.: US09437728B2Publication Date: 2016-09-06
- Inventor: Wataru Saito , Syotaro Ono , Toshiyuki Naka , Shunji Taniuchi , Miho Watanabe , Hiroaki Yamashita
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Patterson & Sheridan LLP
- Priority: JP2011-014503 20110126
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/08 ; H01L29/10 ; H01L29/739 ; H01L29/06 ; H01L29/423

Abstract:
A first semiconductor device of an embodiment includes a first semiconductor layer of a first conductivity type, a first control electrode, an extraction electrode, a second control electrode, and a third control electrode. The first control electrode faces a second semiconductor layer of the first conductivity type, a third semiconductor layer of a second conductivity type, and a fourth semiconductor layer of a first conductivity type, via a first insulating film. The second control electrode and the third control electrode are electrically connected to the extraction electrode, and face the second semiconductor layer under the extraction electrode, via the second insulating film. At least a part of the second control electrode and the whole of the third control electrode are provided under the extraction electrode. The electrical resistance of the second control electrode is higher than the electrical resistance of the third control electrode.
Public/Granted literature
- US20160043213A1 SEMICONDUCTOR DEVICE Public/Granted day:2016-02-11
Information query
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