Invention Grant
- Patent Title: Production device for a graphene thin film
- Patent Title (中): 石墨烯薄膜生产装置
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Application No.: US14446464Application Date: 2014-07-30
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Publication No.: US09437823B2Publication Date: 2016-09-06
- Inventor: Suk Tai Chang , Yeongun Ko
- Applicant: Chung-Ang University Industry—Academy Cooperation Foundation
- Applicant Address: KR Seoul
- Assignee: Chung-Ang University Industry-Academy Cooperation Foundation
- Current Assignee: Chung-Ang University Industry-Academy Cooperation Foundation
- Current Assignee Address: KR Seoul
- Agency: Hammer & Associates, P.C.
- Priority: KR10-2011-0096441 20110923
- Main IPC: B05C5/02
- IPC: B05C5/02 ; H01L51/00 ; H01L29/16 ; H01L31/18 ; C01B31/04 ; B05C11/02 ; H01L29/778
Abstract:
The present invention relates to a production device for graphene thin film. The production device for graphene thin film according to the present invention may comprise a deposition plate in contact with a substrate at an obtuse or acute angle, wherein the substrate is coated with a graphene oxide solution; and a reciprocating linear motion device connected to the deposition plate to put the deposition plate into reciprocating linear motion.
Public/Granted literature
- US20140331920A1 PRODUCTION DEVICE FOR A GRAPHENE THIN FILM Public/Granted day:2014-11-13
Information query
