Invention Grant
- Patent Title: Method of manufacturing light-emitting device
- Patent Title (中): 制造发光装置的方法
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Application No.: US13524203Application Date: 2012-06-15
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Publication No.: US09440880B2Publication Date: 2016-09-13
- Inventor: Akihisa Shimomura
- Applicant: Akihisa Shimomura
- Applicant Address: JP
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP
- Agency: Husch Blackwell LLP
- Priority: JP2011-135125 20110617
- Main IPC: C03B23/203
- IPC: C03B23/203 ; C03C27/06

Abstract:
A method of manufacturing a sealed structure with excellent hermeticity and a method of manufacturing a light-emitting device sealed with the sealed structure. In the methods of manufacturing a sealed structure and a light-emitting device using a glass frit layer, a first step of forming a buffer layer for preventing a crack generated in a substrate and the glass frit layer by laser light irradiation, a second step of forming the glass frit layer to overlap with the buffer layer over the substrate, and a third step of welding the substrates by irradiating the glass frit layer or the buffer layer with laser light are performed, whereby a sealed structure with high hermeticity and a reliable light-emitting device sealed with the sealed structure can be manufactured. By applying the method of manufacturing a light-emitting device especially to an organic EL element, a highly reliable light-emitting device can be obtained.
Public/Granted literature
- US20120318023A1 METHOD OF MANUFACTURING LIGHT-EMITTING DEVICE Public/Granted day:2012-12-20
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