Invention Grant
US09441065B2 Curable composition for imprints, cured product and method for manufacturing a cured product
有权
用于印记的固化组合物，固化产物和固化产物的制造方法
- Patent Title: Curable composition for imprints, cured product and method for manufacturing a cured product
- Patent Title (中): 用于印记的固化组合物，固化产物和固化产物的制造方法
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Application No.: US14504583Application Date: 2014-10-02
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Publication No.: US09441065B2Publication Date: 2016-09-13
- Inventor: Kunihiko Kodama , Kyouhei Sakita , Hiroyuki Yonezawa
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2008-308838 20081203; JP2009-005590 20090114; JP2009-176416 20090729
- Main IPC: B29C35/08
- IPC: B29C35/08 ; C08F2/48 ; C08F222/20 ; B82Y10/00 ; B82Y40/00 ; C09D4/00 ; G03F7/00 ; B05D5/00 ; B29C59/00 ; C08F220/18 ; C08F222/14 ; C08F222/24 ; G03F7/004 ; B29K33/04 ; B29K105/00
Abstract:
Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator.
Public/Granted literature
- US20150014894A1 CURABLE COMPOSITION FOR IMPRINTS, CURED PRODUCT AND METHOD FOR MANUFACTURING A CURED PRODUCT Public/Granted day:2015-01-15
Information query
IPC分类:
