Invention Grant
US09441288B2 Mask for thin film deposition and method of manufacturing OLED using the same
有权
用于薄膜沉积的掩模和使用其制造OLED的方法
- Patent Title: Mask for thin film deposition and method of manufacturing OLED using the same
- Patent Title (中): 用于薄膜沉积的掩模和使用其制造OLED的方法
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Application No.: US12359112Application Date: 2009-01-23
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Publication No.: US09441288B2Publication Date: 2016-09-13
- Inventor: Dong-Young Sung , Hong-Ryul Kim
- Applicant: Dong-Young Sung , Hong-Ryul Kim
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Priority: KR10-2008-0085738 20080901
- Main IPC: C23C16/50
- IPC: C23C16/50 ; C23C16/00 ; C23F1/00 ; H01L21/306 ; C23C14/04 ; C23C16/04 ; C23C18/16 ; C30B25/04 ; H01L51/00

Abstract:
A mask for thin film deposition used in forming an organic thin film or a conductive layer in an organic light emitting device is disclosed. In one embodiment, the mask includes i) a base member, ii) a plurality of slits configured to penetrate through the base member, wherein the plurality of slits have a predetermined length and extend in a first direction, wherein the plurality of slits comprise an outermost slit positioned in an outermost in a second direction having a predetermined angle with respect to the first direction, and wherein the outermost slit comprises two sub-slits separated from each other and iii) a rib supporting part formed between and contacting the two sub-slits, wherein the rib supporting part extends from a rib which is adjacent to the outermost slit.
Public/Granted literature
- US20100055810A1 MASK FOR THIN FILM DEPOSITION AND METHOD OF MANUFACTURING OLED USING THE SAME Public/Granted day:2010-03-04
Information query
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