- Patent Title: Projection optical system, exposure apparatus, and exposure method
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Application No.: US13889780Application Date: 2013-05-08
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Publication No.: US09442360B2Publication Date: 2016-09-13
- Inventor: Yasuhiro Omura
- Applicant: Nikon Corporation
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Morrison & Foerster LLP
- Priority: JP2003-128154 20030506; JP2003-350647 20031009; JP2003-364596 20031024
- Main IPC: G02B17/00
- IPC: G02B17/00 ; G03B27/70 ; G03B27/52 ; G03F7/20 ; G02B17/08

Abstract:
A projection objective includes at least four curved mirrors, which include a first curved mirror that is a most optically forward mirror and a second curved mirror that is a second most optically forward mirror, as defined along a light path. In addition, an intermediate lens element is disposed physically between the first and second mirrors, the intermediate lens element being a single pass type lens. The objective forms an image with a numerical aperture of at least substantially 1.0 in immersion.
Public/Granted literature
- US09500943B2 Projection optical system, exposure apparatus, and exposure method Public/Granted day:2016-11-22
Information query
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B17/00 | 有或无折射元件的具有反射面的系统 |