Invention Grant
- Patent Title: Wet-strippable silicon-containing antireflectant
- Patent Title (中): 湿式可剥离的含硅抗反射剂
-
Application No.: US14739402Application Date: 2015-06-15
-
Publication No.: US09442377B1Publication Date: 2016-09-13
- Inventor: Owendi Ongayi , Charlotte Cutler , Mingqi Li , Shintaro Yamada , James Cameron
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agent S. Matthew Cairns
- Main IPC: G03F7/075
- IPC: G03F7/075 ; G03F7/11 ; G03F7/40 ; G03F7/09 ; C08G77/28 ; C08G77/14 ; G03F7/20 ; C09D183/08 ; C09D183/06 ; C08G77/18
Abstract:
Wet-strippable antireflective compositions comprising one or more silicon-containing polymers that are free of Q-monomers and hydridosilanes as polymerized units are provided. These compositions are useful in the manufacture of various electronic devices.
Information query
IPC分类:
