Invention Grant
- Patent Title: Method for producing a microscreen
- Patent Title (中): 微型筛选方法
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Application No.: US14770244Application Date: 2014-02-17
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Publication No.: US09442379B2Publication Date: 2016-09-13
- Inventor: Susanne Kornely , Markus Schieber , Daniel Sickert
- Applicant: SIEMENS AKTIENGESELLSCHAFT
- Applicant Address: DE Munich
- Assignee: SIEMENS AKTIENGESELLSCHAFT
- Current Assignee: SIEMENS AKTIENGESELLSCHAFT
- Current Assignee Address: DE Munich
- Agency: Slayden Grubert Beard PLLC
- Priority: DE102013203056 20130225
- International Application: PCT/EP2014/052997 WO 20140217
- International Announcement: WO2014/128073 WO 20140828
- Main IPC: B01D67/00
- IPC: B01D67/00 ; G03F7/40 ; B01D39/16 ; B01D69/02 ; G03F7/20 ; G03F7/32 ; B01D61/14
Abstract:
A microscreen, substantially formed of a photoresist material, is produced by applying a photoresist layer to a support using a liquid photoresist, partially covering the photoresist layer with a mask that defines the structure of the microscreen, exposing the photoresist to radiation, developing the photoresist, and removing the photoresist from the support.
Public/Granted literature
- US20160004162A1 METHOD FOR PRODUCING A MICROSCREEN Public/Granted day:2016-01-07
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