Invention Grant
US09442398B2 Position detector, lithography apparatus, and device manufacturing method 有权
位置检测器,光刻设备和器件制造方法

Position detector, lithography apparatus, and device manufacturing method
Abstract:
A position detector configured to detect a position of an object to be detected. The position detector has an optical system configured to detect a mark on the object to be detected that includes a lens that has a positive refractive power, and a reflection member configured to reflect a light flux that passes through the lens in a convergent state or a divergent state. The reflection member is configured from at least one material of a material that exhibits a refractive index of less than 1.0 and an extinction coefficient of greater than 0.0, and a material that exhibits a refractive index of greater than 1.0 and an extinction coefficient of greater than 0.5.
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