Invention Grant
- Patent Title: Position detector, lithography apparatus, and device manufacturing method
- Patent Title (中): 位置检测器,光刻设备和器件制造方法
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Application No.: US13964238Application Date: 2013-08-12
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Publication No.: US09442398B2Publication Date: 2016-09-13
- Inventor: Ryo Sasaki
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2012-184543 20120823
- Main IPC: G03F9/00
- IPC: G03F9/00 ; G01B11/14

Abstract:
A position detector configured to detect a position of an object to be detected. The position detector has an optical system configured to detect a mark on the object to be detected that includes a lens that has a positive refractive power, and a reflection member configured to reflect a light flux that passes through the lens in a convergent state or a divergent state. The reflection member is configured from at least one material of a material that exhibits a refractive index of less than 1.0 and an extinction coefficient of greater than 0.0, and a material that exhibits a refractive index of greater than 1.0 and an extinction coefficient of greater than 0.5.
Public/Granted literature
- US20140055768A1 POSITION DETECTOR, LITHOGRAPHY APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2014-02-27
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