Invention Grant
US09442483B2 Manufacturing control apparatus and manufacturing control system 有权
制造控制装置及制造控制系统

Manufacturing control apparatus and manufacturing control system
Abstract:
A manufacturing control apparatus of an electronic device is configured to implement processing to generate a first model function relating to a relationship between a characteristic of a component included in the electronic device. The apparatus is configured to implement processing to determine a first manufacturing condition value to obtain the characteristic of the component based on the first model function. The apparatus is configured to implement processing to calculate a squared prediction error of a measured value of the characteristic of the component. The apparatus is configured to implement processing to determine a second manufacturing condition value of the next electronic device according to the calculated squared prediction error.
Information query
Patent Agency Ranking
0/0