Invention Grant
US09443700B2 Electron beam plasma source with segmented suppression electrode for uniform plasma generation
有权
具有用于均匀等离子体产生的分段抑制电极的电子束等离子体源
- Patent Title: Electron beam plasma source with segmented suppression electrode for uniform plasma generation
- Patent Title (中): 具有用于均匀等离子体产生的分段抑制电极的电子束等离子体源
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Application No.: US14176365Application Date: 2014-02-10
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Publication No.: US09443700B2Publication Date: 2016-09-13
- Inventor: Leonid Dorf , Shahid Rauf , Kenneth S. Collins , Nipun Misra , Kartik Ramaswamy , James D. Carducci , Steven Lane
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agent Robert M. Wallace
- Main IPC: H01J37/32
- IPC: H01J37/32
Abstract:
A plasma reactor that generates plasma in a workpiece processing chamber by an electron beam, has an electron beam source and segmented suppression electrode with individually biased segments to control electron beam density distribution.
Public/Granted literature
- US20140265855A1 ELECTRON BEAM PLASMA SOURCE WITH SEGMENTED SUPPRESSION ELECTRODE FOR UNIFORM PLASMA GENERATION Public/Granted day:2014-09-18
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