Invention Grant
- Patent Title: Surface-emitting semiconductor laser device and method for producing the same
- Patent Title (中): 表面发射半导体激光器件及其制造方法
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Application No.: US14803244Application Date: 2015-07-20
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Publication No.: US09444223B2Publication Date: 2016-09-13
- Inventor: Junichiro Hayakawa , Masaya Kumei , Akemi Murakami , Takashi Kondo , Kazutaka Takeda , Jun Sakurai
- Applicant: FUJI XEROX CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: FUJI XEROX CO., LTD.
- Current Assignee: FUJI XEROX CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2014-215421 20141022
- Main IPC: H01S5/22
- IPC: H01S5/22 ; H01S5/183 ; H01S5/042

Abstract:
Provided is a surface-emitting semiconductor laser device including a substrate; a semiconductor layer formed on the substrate, the semiconductor layer including a first semiconductor multilayer film of a first conductivity type, an active region, and a second semiconductor multilayer film of a second conductivity type, the first semiconductor multilayer film and the second semiconductor multilayer film forming a cavity; and an oxidation-resistant structure including a groove formed along at least a portion of an outer periphery of the semiconductor layer and an oxidation-resistant portion formed on a surface of the groove.
Public/Granted literature
- US20160118773A1 SURFACE-EMITTING SEMICONDUCTOR LASER DEVICE AND METHOD FOR PRODUCING THE SAME Public/Granted day:2016-04-28
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