Invention Grant
- Patent Title: Low profile rotary platform
- Patent Title (中): 低调旋转平台
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Application No.: US14195177Application Date: 2014-03-03
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Publication No.: US09446744B2Publication Date: 2016-09-20
- Inventor: Richard M. Amendolea
- Applicant: Richard M. Amendolea
- Applicant Address: US OH Girard
- Assignee: Centricity Corporation
- Current Assignee: Centricity Corporation
- Current Assignee Address: US OH Girard
- Agency: The Webb Law Firm
- Main IPC: A47F5/025
- IPC: A47F5/025 ; B60S13/02 ; F16M11/08 ; A47B11/00 ; E04H6/40

Abstract:
A rotary platform includes a rotating top plate rotatable about axis and a stationary base plate fixed in relation to the axis. A plurality of bearing elements is disposed in a cavity defined, at least in part, by the base plate and the top plate. The top plate is supported by the plurality of bearing elements, which are rotatable in any direction and about any axis. The top plate is flexible and flexes independently of the base plate. Flexing of the top plate allows the top plate to maximize contact with as many of the bearing elements as possible to improve the load carrying capacity of rotary platform.
Public/Granted literature
- US20140291466A1 Low Profile Rotary Platform Public/Granted day:2014-10-02
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