Invention Grant
US09447004B2 Methods for removing halogenated ethylene impurities in 2,3,3,3-tetrafluoropropene product
有权
在2,3,3,3-四氟丙烯产物中除去卤代乙烯杂质的方法
- Patent Title: Methods for removing halogenated ethylene impurities in 2,3,3,3-tetrafluoropropene product
- Patent Title (中): 在2,3,3,3-四氟丙烯产物中除去卤代乙烯杂质的方法
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Application No.: US14206026Application Date: 2014-03-12
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Publication No.: US09447004B2Publication Date: 2016-09-20
- Inventor: Haiyou Wang , Hsueh Sung Tung
- Applicant: HONEYWELL INTERNATIONAL INC.
- Applicant Address: US NJ Morristown
- Assignee: HONEYWELL INTERNATIONAL INC.
- Current Assignee: HONEYWELL INTERNATIONAL INC.
- Current Assignee Address: US NJ Morristown
- Agency: Scully Scott Murphy and Presser
- Main IPC: C07C17/38
- IPC: C07C17/38 ; C07C17/20 ; C07C17/00 ; C07C17/389 ; C07C17/087 ; C07C17/25
Abstract:
The present process relates to a process comprising: contacting a mixture comprising 2,3,3,3-tetrafluoropropene and at least one halogenated ethylene impurity with at least one adsorbent or at least one chemisorption catalyst to reduce the concentration of said at least one halogenated ethylene impurity.
Public/Granted literature
- US20140275655A1 METHODS FOR REMOVING HALOGENATED ETHYLENE IMPURITIES IN 2,3,3,3-TETRAFLUOROPROPENE PRODUCT Public/Granted day:2014-09-18
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