Invention Grant
US09447365B2 Enhanced cleaning process of chamber used plasma spray coating without damaging coating
有权
增强了室内清洗工艺，使用等离子体喷涂而不损伤涂层
- Patent Title: Enhanced cleaning process of chamber used plasma spray coating without damaging coating
- Patent Title (中): 增强了室内清洗工艺，使用等离子体喷涂而不损伤涂层
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Application No.: US13757646Application Date: 2013-02-01
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Publication No.: US09447365B2Publication Date: 2016-09-20
- Inventor: Sumanth Banda , Jennifer Y. Sun
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Lowenstein Sandler LLP
- Main IPC: B08B3/04
- IPC: B08B3/04 ; C11D7/08 ; C11D11/00 ; B08B3/12 ; H01L21/02
Abstract:
A method including immersing a ceramic coated article into a bath including an HF acid solution having NH4F with a molar concentration of about 0.1M to 1.0M for a time period to remove a deposition, and rinsing the ceramic coated article.
Public/Granted literature
- US20140221188A1 ENHANCED CLEANING PROCESS OF CHAMBER USED PLASMA SPRAY COATING WITHOUT DAMAGING COATING Public/Granted day:2014-08-07
Information query
IPC分类:
