Invention Grant
- Patent Title: Processing chamber gas delivery system with hot-swappable ampoule
- Patent Title (中): 具有热插拔安瓿的处理室气体输送系统
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Application No.: US14209383Application Date: 2014-03-13
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Publication No.: US09447497B2Publication Date: 2016-09-20
- Inventor: Dien-Yeh Wu , Mark S. Johnson , David M. Santi , Hyman Lam
- Applicant: Dien-Yeh Wu , Mark S. Johnson , David M. Santi , Hyman Lam
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: C23C16/455
- IPC: C23C16/455
Abstract:
Disclosed are apparatus and methods for supplying a constant flow of precursor gas to a processing chamber. The apparatus described, and methods of use, allow a precursor ampoule to be removed from the gas delivery system without interrupting the process.
Public/Granted literature
- US20140261733A1 Processing Chamber Gas Delivery System with Hot-Swappable Ampoule Public/Granted day:2014-09-18
Information query
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