Invention Grant
US09447499B2 Dual plenum, axi-symmetric showerhead with edge-to-center gas delivery
有权
双重气室，轴对称淋浴喷头，具有边缘到中心的气体输送
- Patent Title: Dual plenum, axi-symmetric showerhead with edge-to-center gas delivery
- Patent Title (中): 双重气室，轴对称淋浴喷头，具有边缘到中心的气体输送
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Application No.: US13531254Application Date: 2012-06-22
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Publication No.: US09447499B2Publication Date: 2016-09-20
- Inventor: Shambhu N. Roy , Vincent E. Burkhart , Natan Solomon , Sanjay Gopinath , Kaihan Abidi Ashtiani , Bart van Schravendijk , Jason Stevens , Dhritiman Subha Kashyap , David Cohen
- Applicant: Shambhu N. Roy , Vincent E. Burkhart , Natan Solomon , Sanjay Gopinath , Kaihan Abidi Ashtiani , Bart van Schravendijk , Jason Stevens , Dhritiman Subha Kashyap , David Cohen
- Applicant Address: US CA Fremont
- Assignee: Novellus Systems, Inc.
- Current Assignee: Novellus Systems, Inc.
- Current Assignee Address: US CA Fremont
- Agency: Weaver Austin Villeneuve & Sampson LLP
- Main IPC: B05B1/14
- IPC: B05B1/14 ; C23C16/455
Abstract:
A dual-plenum showerhead for semiconductor processing operations is provided. The showerhead may include a faceplate with two sets of gas distribution holes, each set fed by a separate plenum. One set of gas distribution holes may be through-holes in the faceplate of the showerhead and may allow gases trapped between the faceplate and a plasma dome to flow towards a wafer. The other set of gas distribution holes may distribute gas routed through passages or channels in the faceplate towards the wafer. The passages or channels in the faceplate may include radial channels and annular channels and may be fed from an annular gas distribution channel about the periphery of the faceplate.
Public/Granted literature
- US20130341433A1 DUAL PLENUM, AXI-SYMMETRIC SHOWERHEAD WITH EDGE-TO-CENTER GAS DELIVERY Public/Granted day:2013-12-26
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