Invention Grant
- Patent Title: Support module for lithography system
- Patent Title (中): 光刻系统支持模块
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Application No.: US14344903Application Date: 2012-09-17
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Publication No.: US09447839B2Publication Date: 2016-09-20
- Inventor: Alje Geert Dunning
- Applicant: Mapper Lithography IP B.V.
- Applicant Address: NL Delft
- Assignee: MAPPER LITHOGRAPHY IP B.V.
- Current Assignee: MAPPER LITHOGRAPHY IP B.V.
- Current Assignee Address: NL Delft
- Agency: Blakely Sokoloff Taylor & Zafman LLP
- International Application: PCT/NL2012/050653 WO 20120917
- International Announcement: WO2013/039401 WO 20130321
- Main IPC: F16M13/00
- IPC: F16M13/00 ; F16F15/073 ; F16F3/02
Abstract:
The invention relates to a support structure and support module, for instance for use in a lithography system, comprising a frame and a support for supporting a load, wherein said support is moveable relative to said frame, said support structure further comprising a force compensation spring assembly connecting said support to said frame for at least partially supporting said support and/or said load, wherein said force compensation spring assembly comprises a first spring having a negative stiffness characteristic over a predefined range of motion of said spring, and a second spring having a positive stiffness.
Public/Granted literature
- US20150014510A1 SUPPORT MODULE FOR LITHOGRAPHY SYSTEM Public/Granted day:2015-01-15
Information query
