Invention Grant
- Patent Title: Quality evaluation apparatus, quality evaluation method, and evaluation substrate
- Patent Title (中): 质量评估装置,质量评价方法和评价基板
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Application No.: US13966445Application Date: 2013-08-14
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Publication No.: US09448207B2Publication Date: 2016-09-20
- Inventor: Kazuo Hattori , Isamu Fujimoto , Tadateru Yamada
- Applicant: Murata Manufacturing Co., Ltd.
- Applicant Address: JP Kyoto
- Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Keating & Bennett, LLP
- Priority: JP2012-188773 20120829
- Main IPC: G01N29/04
- IPC: G01N29/04 ; G01N29/14

Abstract:
In a quality evaluation method, an evaluation substrate that includes a mounting region, in which a multilayer capacitor is to be mounted, in a center portion of the evaluation substrate is fixed in place using a plurality of fixed portions at corner portions of the evaluation substrate, each of which is a same distance from the mounting region. A voltage is applied to the multilayer capacitor mounted on the mounting region of the evaluation substrate. Sound is collected using a microphone that is near the multilayer capacitor mounted on the evaluation substrate.
Public/Granted literature
- US20140060192A1 QUALITY EVALUATION APPARATUS, QUALITY EVALUATION METHOD, AND EVALUATION SUBSTRATE Public/Granted day:2014-03-06
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