Invention Grant
US09449736B2 High dielectric compositions for particle formation and methods of forming particles using same
有权
用于颗粒形成的高电介质组合物和使用其形成颗粒的方法
- Patent Title: High dielectric compositions for particle formation and methods of forming particles using same
- Patent Title (中): 用于颗粒形成的高电介质组合物和使用其形成颗粒的方法
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Application No.: US14177984Application Date: 2014-02-11
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Publication No.: US09449736B2Publication Date: 2016-09-20
- Inventor: Evan Koslow , Jocelyn Tindale , Ryan Gerakopulos , Tatiana Lazareva , Angela Kim , Chitral Angammana
- Applicant: GABAE Technologies, LLC
- Applicant Address: US NV Carson City
- Assignee: Gabae Technologies LLC
- Current Assignee: Gabae Technologies LLC
- Current Assignee Address: US NV Carson City
- Agency: Phillips Lytle LLP
- Agent David L. Principe
- Main IPC: H01B3/44
- IPC: H01B3/44 ; H01B3/30 ; D01D5/00 ; B05B5/025 ; B05B5/04 ; D01D5/098 ; D01D5/14 ; D01D5/18 ; D01F1/02 ; D01F1/10 ; B05B5/16 ; D01F6/32 ; D01F6/62 ; D01F6/64 ; D01F6/70
Abstract:
A high dielectric contrast composition for particle formation that includes a high dielectric solvent, and a polymer dissolved into the high dielectric solvent. A method of forming particles including dissolving a polymer in a high dielectric solvent to form a high dielectric composition, and dielectrophoretically spinning the high dielectric composition in an electric field to form particles.
Public/Granted literature
- US20140350151A1 High Dielectric Compositions for Particle Formation and Methods of Forming Particles Using Same Public/Granted day:2014-11-27
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