Invention Grant
US09451684B2 Dual pulse driven extreme ultraviolet (EUV) radiation source method
有权
双脉冲驱动极紫外(EUV)辐射源法
- Patent Title: Dual pulse driven extreme ultraviolet (EUV) radiation source method
- Patent Title (中): 双脉冲驱动极紫外(EUV)辐射源法
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Application No.: US15077187Application Date: 2016-03-22
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Publication No.: US09451684B2Publication Date: 2016-09-20
- Inventor: Daniel A. Corliss , Sadanand V. Deshpande , Veeresh V. Deshpande , Oleg Gluschenkov , Sivarama Krishnan
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent Steven J. Meyers
- Main IPC: H05G2/00
- IPC: H05G2/00

Abstract:
An extreme ultraviolet (EUV) radiation source pellet includes at least one metal particle embedded within a heavy noble gas cluster contained within a noble gas shell cluster. The EUV radiation source assembly can be activated by a sequential irradiation of at least one first laser pulse and at least one second laser pulse. Each first laser pulse generates plasma by detaching outer orbital electrons from the at least one metal particle and releasing the electrons into the heavy noble gas cluster. Each second laser pulse amplifies the plasma embedded in the heavy noble gas cluster triggering a laser-driven self-amplifying process. The amplified plasma induces inter-orbital electron transitions in heavy noble gas and other constitute atoms leading to emission of EUV radiation. The laser pulsing units can be combined with a source pellet generation unit to form an integrated EUV source system.
Public/Granted literature
- US20160205757A1 DUAL PULSE DRIVEN EXTREME ULTRAVIOLET (EUV) RADIATION SOURCE Public/Granted day:2016-07-14
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