Invention Grant
- Patent Title: High-frequency power supply device, and plasma ignition method
- Patent Title (中): 高频电源装置,等离子点火方式
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Application No.: US14904886Application Date: 2014-03-12
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Publication No.: US09451687B2Publication Date: 2016-09-20
- Inventor: Itsuo Yuzurihara , Satoshi Aikawa , Ryosuke Ohma
- Applicant: KYOSAN ELECTRIC MFG. CO., LTD.
- Applicant Address: JP Yokohama-shi
- Assignee: KYOSAN ELECTRIC MFG. CO., LTD.
- Current Assignee: KYOSAN ELECTRIC MFG. CO., LTD.
- Current Assignee Address: JP Yokohama-shi
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2014-019060 20140204
- International Application: PCT/JP2014/056411 WO 20140312
- International Announcement: WO2015/118696 WO 20150813
- Main IPC: H05H1/46
- IPC: H05H1/46

Abstract:
A high-frequency power supply device is provided with a plasma ignition step that supplies pulse power to ignite plasma, and drive power supply step to supply drive power for maintaining the plasma being generated. In the plasma ignition step, an ignition pulse being applied in an ignition pulse output operation is configured as including a main pulse that induces ignition, and a prepulse with lower power than the power of the main pulse and being applied at a stage prior to the main pulse. Since the ignition pulse is configured as including the main pulse and the prepulse, this enables protection of a high-frequency power source against reflected wave power, as well as reliably igniting the plasma.
Public/Granted literature
- US20160165713A1 HIGH-FREQUENCY POWER SUPPLY DEVICE, AND PLASMA IGNITION METHOD Public/Granted day:2016-06-09
Information query
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