Invention Grant
- Patent Title: Embedded architecture using resin coated copper
- Patent Title (中): 嵌入式架构采用树脂涂层铜
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Application No.: US13631959Application Date: 2012-09-29
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Publication No.: US09451696B2Publication Date: 2016-09-20
- Inventor: Dilan Seneviratne , Ching-Ping J. Shen , Liwen Jin , Deepak Arora , Vinodhkumar Raghunathan
- Applicant: Dilan Seneviratne , Ching-Ping J. Shen , Liwen Jin , Deepak Arora , Vinodhkumar Raghunathan
- Applicant Address: US CA Santa Clara
- Assignee: INTEL CORPORATION
- Current Assignee: INTEL CORPORATION
- Current Assignee Address: US CA Santa Clara
- Agency: Konrad Raynes Davda & Victor LLP
- Agent Alan S. Raynes
- Main IPC: H05K1/11
- IPC: H05K1/11 ; H05K3/00 ; H01L23/538 ; H01L23/00 ; H05K1/18 ; H05K3/46 ; H01L23/498

Abstract:
Electronic assemblies and methods for their manufacture are described, including those related to the formation of an assembly including a carrier and a resin coated copper layer positioned on the carrier. The resin coated copper layer includes a first layer comprising a resin and a second layer comprising copper, with the first layer bonded to the second layer. The first layer of the resin coated copper is positioned between the carrier and the second layer of the resin coated copper. An opening is formed in the second layer of the resin coated copper. A die is positioned in the opening. A plurality of dielectric layers and metal pathways are positioned on the second layer and on the die. Other embodiments are described and claimed.
Public/Granted literature
- US20140090879A1 EMBEDDED ARCHITECTURE USING RESIN COATED COPPER Public/Granted day:2014-04-03
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