Invention Grant
- Patent Title: Crystallization processing for semiconductor applications
- Patent Title (中): 半导体应用的结晶处理
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Application No.: US15016328Application Date: 2016-02-05
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Publication No.: US09455145B2Publication Date: 2016-09-27
- Inventor: Stephen Moffatt
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: C30B13/24
- IPC: C30B13/24 ; H01L21/02
Abstract:
A method and apparatus for forming a crystalline semiconductor layer on a substrate are provided. A semiconductor layer is formed by vapor deposition. A pulsed laser melt/recrystallization process is performed to convert the semiconductor layer to a crystalline layer. Laser, or other electromagnetic radiation, pulses are formed into a pulse train and uniformly distributed over a treatment zone, and successive neighboring treatment zones are exposed to the pulse train to progressively convert the deposited material to crystalline material.
Public/Granted literature
- US20160155638A1 CRYSTALLIZATION PROCESSING FOR SEMICONDUCTOR APPLICATIONS Public/Granted day:2016-06-02
Information query
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