Invention Grant
- Patent Title: Display stack fabrication
- Patent Title (中): 显示堆栈制作
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Application No.: US14104791Application Date: 2013-12-12
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Publication No.: US09457544B1Publication Date: 2016-10-04
- Inventor: Anoop Menon , Weihsin Hou , Chin Siong Khor , Yean Chan Woon
- Applicant: Amazon Technologies, Inc.
- Applicant Address: US WA Seattle
- Assignee: Amazon Technologies, Inc.
- Current Assignee: Amazon Technologies, Inc.
- Current Assignee Address: US WA Seattle
- Agency: Lee & Hayes, PLLC
- Main IPC: B32B27/04
- IPC: B32B27/04

Abstract:
In some implementations, a process includes forming a layer of a liquid optically clear adhesive (LOCA) on a surface of a first substrate. Additionally, the LOCA can be contacted with a surface of a second substrate. The LOCA can then be exposed to Ultraviolet (UV) radiation. After exposing the LOCA to UV radiation, additional substrates can be coupled to the first substrate, the second substrate, or both to form a display stack. In an implementation, the total energy/unit area for the UV radiation applied to the LOCA can be no greater than 25,000 kJ/cm2.
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