Invention Grant
- Patent Title: Photoresist overcoat compositions and methods of forming electronic devices
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Application No.: US14938340Application Date: 2015-11-11
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Publication No.: US09458348B2Publication Date: 2016-10-04
- Inventor: Young Cheol Bae , Rosemary Bell , Jong Keun Park , Seung-Hyun Lee
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agent Jonathan D. Baskin
- Main IPC: G03F7/11
- IPC: G03F7/11 ; C09D133/16 ; G03F7/004 ; G03F7/20 ; G03F7/30 ; H01L21/308 ; G03F7/32 ; C08K5/17 ; C08K5/3415 ; C08K5/3435 ; C09D133/10 ; G03F7/16
Abstract:
Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.
Public/Granted literature
- US20160137874A1 PHOTORESIST OVERCOAT COMPOSITIONS AND METHODS OF FORMING ELECTRONIC DEVICES Public/Granted day:2016-05-19
Information query
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