Invention Grant
- Patent Title: Deflection measuring device and deflection measuring method
- Patent Title (中): 偏转测量装置和偏转测量方法
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Application No.: US14296638Application Date: 2014-06-05
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Publication No.: US09459093B2Publication Date: 2016-10-04
- Inventor: Hidenori Sato , Nobuhiro Komine
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Minato-ku
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: G01B11/16
- IPC: G01B11/16 ; G01B11/24
Abstract:
According to one embodiment, a deflection measuring device that irradiates an effective region of a pattern transfer plate on which a pattern is formed, with parallel lights from at least two directions, and detects interference fringes of the parallel lights reflected from the effective region.
Public/Granted literature
- US20150233706A1 DEFLECTION MEASURING DEVICE AND DEFLECTION MEASURING METHOD Public/Granted day:2015-08-20
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