Invention Grant
US09459405B2 Method for fabricating a semiconductor device for use in an optical application 有权
制造用于光学应用的半导体器件的方法

Method for fabricating a semiconductor device for use in an optical application
Abstract:
A semiconductor device for use in an optical application and a method for fabricating the device. The device includes: an optically passive aspect that is operable in a substantially optically passive mode; and an optically active material having a material that is operable in a substantially optically active mode, wherein the optically passive aspect is patterned to include a photonic structure with a predefined structure, and the optically active material is formed in the predefined structure so as to be substantially self-aligned in a lateral plane with the optically passive aspect.
Public/Granted literature
Information query
Patent Agency Ranking
0/0