Invention Grant
- Patent Title: Method for fabricating a semiconductor device for use in an optical application
- Patent Title (中): 制造用于光学应用的半导体器件的方法
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Application No.: US14867184Application Date: 2015-09-28
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Publication No.: US09459405B2Publication Date: 2016-10-04
- Inventor: Lukas Czornomaz , Jens Hofrichter , Mirja Richter , Heike Riel
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Kurt Goudy
- Main IPC: H01L21/00
- IPC: H01L21/00 ; G02B6/122 ; G02B6/12 ; H01S5/00 ; G02B6/124 ; G02B6/136 ; G02B6/42 ; H01L31/18 ; H01L33/00 ; H01S5/183

Abstract:
A semiconductor device for use in an optical application and a method for fabricating the device. The device includes: an optically passive aspect that is operable in a substantially optically passive mode; and an optically active material having a material that is operable in a substantially optically active mode, wherein the optically passive aspect is patterned to include a photonic structure with a predefined structure, and the optically active material is formed in the predefined structure so as to be substantially self-aligned in a lateral plane with the optically passive aspect.
Public/Granted literature
- US20160018596A1 SEMICONDUCTOR DEVICE Public/Granted day:2016-01-21
Information query
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