Invention Grant
- Patent Title: Mask plate and method of patterning using the mask plate
- Patent Title (中): 掩模板和使用掩模板的图案化方法
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Application No.: US14525156Application Date: 2014-10-27
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Publication No.: US09459524B2Publication Date: 2016-10-04
- Inventor: Dong Wang
- Applicant: BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
- Applicant Address: CN Beijing CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.,BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.,BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Beijing CN Beijing
- Agency: Blakely Sokoloff Taylor & Zafman LLP
- Priority: CN201410259177 20140611
- Main IPC: G03F1/50
- IPC: G03F1/50

Abstract:
The embodiment of the present invention provides a mask plate and a method of patterning using the mask plate, the mask plate comprising a light shielding area and an opening area, the edge of the opening area being in a concave-convex shape. The embodiment of the present invention, by setting the edge of the opening area of the mask plate in a concave-convex shape, can improve linearity of the matrix edge formed after the processes of coating, exposing, developing, roasting of the photoresist, so as to prevent the problem of generating a jagged or a wavy shape at the matrix edge of a color filter in a color film substrate, thereby improving uniformity of color display of a liquid crystal display. The effect is particularly significant for a product using a negative photoresist or with a relatively thin line width in the formed matrix.
Public/Granted literature
- US20150362833A1 MASK PLATE AND METHOD OF PATTERNING USING THE MASK PLATE Public/Granted day:2015-12-17
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