Invention Grant
- Patent Title: Negative photosensitive resin composition, cured resin film, partition walls and optical element
- Patent Title (中): 负感光树脂组合物,固化树脂膜,隔墙和光学元件
-
Application No.: US14688366Application Date: 2015-04-16
-
Publication No.: US09459529B2Publication Date: 2016-10-04
- Inventor: Keigo Matsuura , Hideyuki Takahashi , Masayuki Kawashima , Daisuke Kobayashi
- Applicant: ASAHI GLASS COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: Asahi Glass Company, Limited
- Current Assignee: Asahi Glass Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2012-239880 20121031
- Main IPC: G03F7/038
- IPC: G03F7/038 ; G03F7/075 ; G03F7/028 ; G03F7/027 ; G03F7/004 ; B32B27/16 ; B32B27/24 ; B32B27/26 ; B32B27/20 ; C08F290/06 ; G02F1/1335

Abstract:
To provide a negative photosensitive resin composition which is capable of imparting good ink repellency to a cured film, particularly to the upper surface of partition walls, and which has characteristics such that an ink repellent agent is less likely to remain in opening sections defined by the partition walls even without UV/O3 irradiation treatment, and the ink is permitted to uniformly wet-spread without unevenness. A negative photosensitive resin composition characterized by comprising (A) an alkali-soluble resin or alkali-soluble monomer, which has a photo-curability, (B) a photopolymerization initiator, (C) an ink repellent agent having fluorine atoms, and (D) a compound which is a partially hydrolyzed condensate of a hydrolysable silane compound mixture containing a hydrolysable silane compound having a mercapto group and a hydrolysable group and/or a hydrolysable silane compound having a group with an ethylenic double bond and a hydrolysable group, and which has no fluorine atom.
Public/Granted literature
- US20150219992A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED RESIN FILM, PARTITION WALLS AND OPTICAL ELEMENT Public/Granted day:2015-08-06
Information query
IPC分类: